Hf-Based High-k Dielectrics | Young-Hee Kim | Jack C. Lee | B.H. Juang | Science & Technology | Engineering | eBooks
Hf-Based High-k Dielectrics
By: Young-Hee Kim, Jack C. Lee ~ Editor: B.H. Juang
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Platforms
Windows Vista / XP / 2000, Mac OS X Tiger Features
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Download Now Price: $40.80
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Hf-Based High-k Dielectrics Summary:
| Semiconductors continue to get smaller while at the same time the density of devices that conduct electrons have increased tremendously. Because of this density of functions and devices, engineers and scientists search for practical and effective new materials that are non-conductive (dielectric) in order to build much smaller and viable gates. Chip density and performance improvements are driven by aggressive scaling of semiconductor devices. In both logic and memory applications, SiO2 gate dielectrics have reached their minimum thickness due to direct tunneling current and reliability concerns. Therefore high-k dielectrics have attracted a great deal of attention from industries as the replacement for conventional SiO2 gate dielectrics. |
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